Research

As we continue further into the 21st century, many large scientific challenges facing society today involve increasingly small-scale solutions. From renewable energy materials to medical devices, to flexible electronics, water purification, and more, nanotechnology and thin films have enabled powerful technological advances.

Atomic layer deposition (ALD) is a potent tool for building materials on the atomic scale, enabling complex device design. However, its high precision relies on surface chemical reactions behaving in specific and self-limiting ways, so understanding and controlling how these reactions work is critical.

My research studies how a variety of surface chemistries work together to enable ALD in new ways, expanding its chemical toolbox and allowing for design and synthesis of a greater range of new materials.

My interdisciplinary research connects experiment and theory, inorganic and organic chemistry, and activating and passivating reactions. I value working extensively with collaborators.



Publications

J.R. Schneider, S.S. Nathan, A. Werbrouck, J. Yarbrough, A.B. Shearer, A. Rothman, S.F. Bent, “Applications of Catalytically Activated Atomical Layer Deposition to New Material Systems,” In Prep.


J.R. Schneider, C. de Paula, N.E. Richey, S.T. Oyakhire, J.G. Baker, S.F. Bent, “Understanding and Utilizing Reactive Oxygen Reservoirs, in Atomic Layer Deposition of Metal Oxides with Ozone,” Submitted.


S.T. Oyakhire, W. Zhang, A. Shin, R. Xu, D.T. Boyle, Z. Yu, Y. Ye, Y. Yang, J.A. Raiford, W. Huang, J.R. Schneider, Y. Cui, S.F. Bent, “Electrical Resistance of the Current Collector Controls Lithium Morphology,” Submitted.


J.R. Schneider* & C. de Paula*, J. Lewis, J. Woodruff, J.A. Raiford, S.F. Bent, “The Importance of Decarbonylation Mechanisms in the Atomic Layer Deposition of High-Quality Ru Films by Zero-Oxidation State Ru(DMBD)(CO)3,” Small, 2022. doi: 10.1002/smll.202105513
*authors contributed equally to this work


J.G. Baker, J.R. Schneider, C. de Paula, A.J.M. Mackus, S.F. Bent, “Identification of Highly Active Surface Iron Sites on Ni(OOH) for the Oxygen Evolution Reaction by Atomic Layer Deposition,” J. Catal., 2021. doi.org/10.1016/j.jcat.2020.09.035


S.T. Oyakhire, W. Huang, H. Wang, D.T. Boyle, J.R. Schneider, C. de Paula, Y. Wu, Y. Cui, S.F. Bent, “Revealing and Elucidating ALD-Derived Control of Lithium Plating Microstructure,” Adv. Energy Mater., 2020. doi.org/10.1002/aenm.202002736


J.R. Schneider, J.G. Baker, S.F. Bent, “The Influence of Ozone: Atomic Layer Deposition Growth Mechanisms of Fe2O3 Using tert-butylferrocene and O3,” Adv. Mater. Interfaces, 2020. doi.org/10.1002/admi.202000318


J.G. Baker, J.R. Schneider, S.F. Bent, “Nucleation Effects in the Atomic Layer Deposition of Nickel-Aluminum Oxide Thin Films,” Chem. Mater., 2020. doi.org/10.1021/acs.chemmater.9b04630


J.G. Baker, J.R. Schneider, J.A. Garrido Torres, J.A. Singh, A.J.M. Mackus, M. Bajdich, S.F. Bent, “The Role of Aluminum in Promoting Ni-Fe-OOH Electrocatalysts for the Oxygen Evolution Reaction,” ACS Appl. Energy Mater., 2019. doi.org/10.1021/acsaem.9b00265


A.J.M. Mackus* & J.R. Schneider*, C. MacIsaac, J.G. Baker, S.F. Bent, “Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review,” Chem. Mater., 2019. doi.org/10.1021/acs.chemmater.8b02878
*authors contributed equally to this work


C. MacIsaac, J.R. Schneider, R.G. Closser, T.R. Hellstern, D.S. Bergsman, J. Park, Y. Liu, R. Sinclair, S.F. Bent, “Atomic and Molecular Layer Deposition of Hybrid Mo-Thiolate Thin Films with Enhanced Catalytic Activity,” Adv. Func. Mat., 2018. doi.org/10.1002/adfm.201800852